MIT unveils ultra-efficient 3D nanoscale transistors that could revolutionize future electronics

Nanoscale 3D transistors made from ultrathin semiconductor materials
(Image credit: iStock)

MIT researchers have revealed nanoscale transistors that could potentially reshape the future of efficient electronics. Built using a unique 3D nanowire structure, these transistors surpass traditional silicon-based models by operating on a far smaller scale. As silicon-based transistors face critical limitations in miniaturization, MIT’s design paves the way for faster, cooler, and more compact electronic components.

The design utilizes vertical nanowire field-effect transistors (VNFETs), which manage electron flow by orienting the structure vertically rather than the conventional horizontal layout. This approach sidesteps several limitations associated with horizontal transistors, which face physical barriers to further scaling.

By taking advantage of the 3D structure, MIT’s VNFETs minimize heat production and power leakage, common challenges in densely packed circuits where silicon transistors typically struggle. The potential for stacking layers of these 3D transistors also allows for greater computing density, supporting the demands of modern high-performance computing and data-driven technologies.

According to Yanjie Shao, an MIT postdoc and lead author of a paper on the new transistors, “This is a technology with the potential to replace silicon, so you could use it with all the functions that silicon currently has, but with much better energy efficiency.”

One of the main benefits of MIT’s approach lies in the adaptability of these VNFETs, which use alternative semiconductor materials rather than silicon. This choice allows higher conductivity at smaller scales, maintaining efficiency and reducing energy consumption. The switch from silicon addresses issues like quantum tunneling—where electrons unintentionally leak through barriers in silicon transistors at nanoscale sizes—allowing for more reliable, stable operations.

These nanoscale transistors come when the semiconductor industry is pushing to overcome the limitations of Moore’s Law. This suggests that the number of transistors in an integrated circuit doubles roughly every two years. With silicon transistors nearing their theoretical limits, new materials and designs like VNFETs represent a promising direction for sustaining technological progress. If successfully commercialized, these transistors could influence various industries, from smartphones and computers to large-scale data centers and artificial intelligence applications requiring high processing power.

Currently, the VNFETs remain in the experimental phase, but MIT’s work shows clear potential for reshaping the electronics landscape by enabling smaller, faster, and more energy-efficient devices.

Kunal Khullar
News Contributor

Kunal Khullar is a contributing writer at Tom’s Hardware.  He is a long time technology journalist and reviewer specializing in PC components and peripherals, and welcomes any and every question around building a PC.

  • cuvtixo
    Are the new semi-conductor materials a secret? A combination of materials? Gallium? Graphene? That, in itself, would be headline-worthy. But if Dr. Yanjie Shao didn't go into more detail... it sounds a little like The Wizard demanding "don't look behind that curtain!" The mind-boggling complexity of the latest ASML fab machines, operating mainly at TMSC... if either of those companies starts talking about such 3D chips, or even Intel, I'll pay attention. This is vaporware until then.
    Reply
  • deesider
    cuvtixo said:
    Are the new semi-conductor materials a secret? A combination of materials? Gallium? Graphene? That, in itself, would be headline-worthy. But if Dr. Yanjie Shao didn't go into more detail... it sounds a little like The Wizard demanding "don't look behind that curtain!" The mind-boggling complexity of the latest ASML fab machines, operating mainly at TMSC... if either of those companies starts talking about such 3D chips, or even Intel, I'll pay attention. This is vaporware until then.
    The abstract of the Nature article states:

    Here, we report scaled vertical-nanowire heterojunction tunnelling transistors that are based on the broken-band GaSb/InAs system.
    Reply